Analysis for the development and manufacture of solar cells • Electrochemical characterization of solar cells • Monitoring of electroplating processes by voltammetry, titration and ion chromatography Customized analysis for development and production of solar cells The market for solar cells is booming. However, interna-In the manufacturing process, wet chemical processes 02 tional competition is tough. Opportunities are available play a crucial role. The chemicals used in the process baths for systems with a high degree of effi ciency and the pos-are consumed continuously, while the concentration of sibility for cost reduction in the manufacturing process. reaction products in the process solution increases. This Thinner wafers and the development of thin-layer tech-requires continuous monitoring, which in turn depends nologies satisfy the demand for a considerably reduced on the right analytical instrumentation. input of materials. Metrohm is the industry’s preferred choice for high-quality laboratory and process analyzers, applications know-how and a fi rst-class, on-the-spot service. Electrochemical and photoelectrochemical Voltammetry for developing and electroplating characterization of solar cells baths Potentiostats/galvanostats from Metrohm Autolab enable Electroplating methods with a very high material yield are straightforward analysis of the electrochemical and photo - used to form the electric contact and generate CIS and electrochemical processes in dye-sensitized solar cells and CISG semiconductor materials. organic solar cells. Both static and dynamic photoelectrochemical tests (e.g. IMPS/IMVS) can be performed using Using Metrohm’s 797 VA Computrace, the main constit-the integral light source (LED) and control unit. uents of electroplating baths and additives can be analyzed very easily and cost-effectively, e.g. The solar cell characteristics are evaluated and calculated automatically by the NOVA software. For this, the • Copper stand ard methods can be selec ted, modifi ed or freely • Indium pro grammed depending on the task. • Selenium • Thiourea • Easy operation using ready-made methods: • Cadmium IV curve / IMVS / IMPS • Gallium • Convenience due to automated evaluations and calculations, e.g. - max. power point - fi ll factor - electron diffusion coeffi cient - open-circuit voltage and short-circuit current • Integration into test stands • LabVIEW compatibility 03 Multicomponent determination with a single analysis Ion Chromatography (IC) enables the determination of numerous main and secondary components of electroplat ing baths as well as traces of impurities, be they orga nic or inorganic ions or other polar substances, with utmost reliability and precision. A major benefi t of ion 850 Professional IC The bath content of HF, acetic acid, HNO , H SO in etching chro matography is that chemically similar substances can 3 2 4 baths is determined using conductivity detection. Si is measured be determined in parallel in a single analysis. The analyte via post-column reaction (PCR) and subsequent UV/VIS detection. concentrations may be anything between the ng/L to % The content of H SiF is calculated from the concentration of Si. 2 6 ranges. Typical applications HF/HNO /H SiF 3 2 6 Alkaline and H SO 2 4 acidic texturizing Acetic acid Alkalinity Acidity pH and conductivity Washing and Rinsing additives cleaning Complexing agents (NTA, EDTA, ...) H O 2 2 Hydrophilization Alkalinity Acidity pH and conductivity Direct measurements Parameters from third-party instruments Titrimetric determination of bath components 905 Plate Titrando Titration is a robust, well established analytical technique A broad range of different analyses can be performed with the in monitoring electroplating processes. Titration combines 905 Plate Titrando, e.g. determining components of electroplating baths, the composition of the acidic content of etching baths utmost precision with a very easy procedure. In most cases or controlling the purity of rinsing solutions. it is possible to use undiluted sample solution to determine the components of the reaction solution. This enables even semiskilled users to carry out the analysis fast and accurately. www.metrohm.com G, CH-9101 Herisau ohm A , print Metr SW 10 Subject to change Layout Ecknauer+Schoch A 8.000.5049EN – 2010-